싸이엔텍
제품안내
PVD
  • HOME
  • >
  • 제품소개
  • >
  • PVD
Total 3건 1 페이지
  • RF/DC Sputter system 댓글+ 2개
    3
    DISCRIPTION

    · Pump : Turbo & rotary pump

    · Base pressure : ~10(-7) Torr

    · Max, temp : about 700 degree C

    · Heating method : Halogen lamp

    · Gas : O2, N2, Ar

    · Pressure control : Manual gate valve & MFC or

    · Pressure control : Automatic pressure control

    · Power : DC(1kW) & RF(13,56MHz, 600W)
  • E-beam evaporator system
    2
    DISCRIPTION

    · Purpose : Thin film deposition

    · Pump : Turbo & Rotary pump

    · Base pressure : ~10(-7) Torr

    · E-gun : 4-pocket, 4 cc

    · Power : 6kW with sweep

    · Application : film, cloth, flexible sample coating
  • Thermal Evaporator system
    1
    DISCRIPTION

    · Purpose : Thin film deposition

    · Pump : Turbo & Rotary pump

    · Base pressure : ~E(-7) Torr

    · Power : AC 1.5W / 2 channel

    · Thickness measureement(QCM)
게시물 검색
주소 : 경기도 수원시 영통구 신원로 306 이노플렉스 1동 303호    |    대표 : 조성원
TEL : 031-224-3280 / 3211    |    FAX : 031-224-5778
All Copyright 싸이엔텍 2016 All right reserved.